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2025-07-24 BY
IN Company News

MKS EDGE6060A – G01 60MHz GENERATOR 660 – 210105 – 110 | high – performance radio – frequency (RF)

Product Overview

The MKS EDGE6060A – G01 60MHz GENERATOR 660 – 210105 – 110 is a high – performance radio – frequency (RF) generator, representing the pinnacle of MKS’ advanced technological offerings in the field of industrial plasma – based processes. As an integral part of MKS’ extensive product portfolio, this generator is engineered to meet the demanding requirements of industries such as semiconductor manufacturing, thin – film deposition, and plasma etching.


At its core, the EDGE6060A – G01 is designed to generate stable and precise 60MHz RF signals. In industrial setups, these signals are used to create and control plasmas, which play a crucial role in various manufacturing processes. For example, in semiconductor fabrication, plasmas are used for etching intricate patterns onto silicon wafers with high precision. The ability of the EDGE6060A – G01 to provide consistent and reliable RF power is essential for maintaining the quality and yield of such delicate manufacturing operations.


This generator is highly valued for its advanced control features and high – power output capabilities. It allows for fine – tuning of the RF power, frequency, and phase, enabling manufacturers to optimize their plasma – based processes according to their specific needs. Hainan Jinlin Electromechanical Equipment Co., Ltd, as a trusted distributor, offers the EDGE6060A – G01 with comprehensive pre – sales support. Our team can help you select the right configuration for your application and provide in – depth technical advice. With a 1 – year warranty, we also ensure reliable after – sales service, giving you peace of mind in your investment.
MOXA ES-1026 Industrial Ethernet Switch, Robust Network Integration Solution

Technical Specifications

Parameter Value
Product Model EDGE6060A – G01 60MHz GENERATOR 660 – 210105 – 110
Manufacturer MKS
Product Type RF Generator
Frequency 60 MHz
Output Power Range [Specify the range, e.g., 0 – 10 kW]
Power Supply [Voltage and phase details, e.g., 220 – 240 VAC, single – phase]
Weight Approximately 50 kg
Dimensions (WxHxD) [Provide dimensions, e.g., 47 cm x 77 cm x 22 cm]
Control Interface [List interfaces, e.g., RS – 232, Ethernet]

Key Features and Benefits

The EDGE6060A – G01 offers several outstanding features that set it apart in the market. Its high – power output capabilities make it suitable for large – scale industrial applications where significant plasma generation is required. The ability to precisely control the RF power, frequency, and phase ensures that the generated plasmas have the desired characteristics, leading to more accurate and efficient manufacturing processes.


The generator is designed for reliability and durability. With a robust construction and high – quality components, it can withstand the rigors of continuous industrial use. The relatively compact dimensions make it suitable for installation in spaces where equipment footprint is a concern.


The advanced control interfaces, such as RS – 232 and Ethernet, allow for easy integration with other industrial control systems. This enables seamless operation and remote monitoring, enhancing the overall efficiency of the manufacturing process. Hainan Jinlin Electromechanical’s pre – sales support ensures that you get the most out of your EDGE6060A – G01. We can assist you in integrating it into your existing production line and optimizing its performance. Our after – sales service, including the 1 – year warranty, means that in case of any technical issues, our team will be there to assist you promptly, minimizing downtime and ensuring the smooth running of your operations.
MCG 2383-ME3811-5 Industrial Control Module, by ABC Corp.

Related Models

  • EDGE6060A – G12 – An upgraded version with potentially enhanced control features or higher power output capabilities, suitable for applications with more demanding requirements compared to the EDGE6060A – G01.
  • EDGE210R40A – G02 – A model with a different frequency (400KHz) and power characteristics, often used in applications where a lower – frequency RF generator is more appropriate, such as in some specific plasma – etching processes.
  • ELITE – 600HA – 01 – A 600 – watt, 13.56MHz RF plasma generator, which has a different power and frequency profile. It may be used in applications where lower power and a different frequency are sufficient, like in some small – scale plasma – based research or development setups.
2025-07-24 BY
IN Company News

MKS 60 MHz GENERATOR EDGE 6060A – G02 660 – 210105R200 | radio – frequency (RF)

MKS 60 MHz GENERATOR EDGE 6060A – G02 660 – 210105R200 Product Introduction

The MKS 60 MHz GENERATOR EDGE 6060A – G02 660 – 210105R200 is a high – performance radio – frequency (RF) generator that plays a crucial role in a variety of industrial and scientific applications. This generator is designed to produce stable and precise RF signals at a frequency of 60 MHz, making it suitable for use in processes such as plasma generation, semiconductor manufacturing, and materials processing.

Product Overview

The MKS EDGE 6060A – G02 is engineered with advanced technology to deliver reliable and consistent RF power output. It is often used in plasma – based processes, where the 60 MHz frequency can effectively ionize gases to create plasma. This plasma can then be used for applications like etching, deposition, and surface treatment in the semiconductor industry. In a semiconductor fabrication plant, for example, the MKS 6060A – G02 can be integrated into a plasma etching system. The precise control of the RF power and frequency provided by this generator allows for highly accurate etching of semiconductor materials, ensuring the production of high – quality microelectronic components.

ABB 3HAC025295-001 Industrial Control Module

The model designation “EDGE 6060A – G02” indicates its specific configuration within MKS’s product line. The “EDGE” series is known for its advanced features and performance capabilities. The “6060A” part likely refers to the base model with specific design characteristics related to power output, frequency range, and control functionality. The “-G02” suffix may denote a particular version or set of upgrades, perhaps related to improved stability, enhanced control interfaces, or compatibility with specific industrial setups.

 

The serial number “660 – 210105R200” is unique to this particular unit. It can be used for tracking purposes during manufacturing, installation, and maintenance. This number helps in identifying the production batch, date of manufacture, and any specific customizations or modifications made to the generator.

Technical Specifications

Parameter Value
Product Model MKS 60 MHz GENERATOR EDGE 6060A – G02 660 – 210105R200
Manufacturer MKS Instruments
Product Type RF Generator
Frequency 60 MHz
Output Power Range [Specify the minimum and maximum power output values, e.g., 100W – 1000W if available]
Power Stability [Describe the power stability, e.g., ±1% of the set power]
Frequency Stability [Specify the frequency stability, e.g., ±0.01 MHz]
Control Interface [List the available control interfaces, such as Ethernet, RS – 485]
Operating Temperature Range Designed to operate in a specific temperature range, e.g., 0°C – 40°C
Dimensions [Provide the physical dimensions of the generator if available]
Weight [List the weight of the generator if available]

Key Features and Benefits

Precise Frequency Generation: The MKS 6060A – G02 is capable of generating an extremely precise 60 MHz RF signal. This precision is vital in applications where accurate control of the plasma frequency is required. In semiconductor manufacturing, for instance, a slight deviation in the RF frequency can lead to inconsistent etching or deposition results, affecting the quality and performance of the final product. The high – precision frequency generation of this generator helps to ensure repeatable and reliable process outcomes.

 

Stable Power Output: It offers a stable power output within its specified range. This stability is crucial for maintaining a consistent plasma state. In plasma – enhanced chemical vapor deposition (PECVD) processes, a stable RF power supply is necessary to deposit uniform thin films on substrates. The MKS 6060A – G02’s stable power output enables the production of high – quality films with consistent thickness and properties.

ABB 3HAC025295-001 Industrial Control Module

Advanced Control Interfaces: The generator is equipped with advanced control interfaces, such as Ethernet or RS – 485. These interfaces allow for easy integration into automated industrial control systems. Operators can remotely monitor and adjust the generator’s parameters, such as power level and frequency, from a central control station. This level of control flexibility enhances the overall efficiency of industrial processes and enables real – time optimization based on process requirements.

 

Reliable Performance: MKS Instruments is known for its high – quality manufacturing standards, and the 6060A – G02 is no exception. The generator is built to withstand the rigors of industrial use, with a robust construction that can endure temperature variations, electrical noise, and mechanical vibrations. Its reliable performance reduces the risk of unexpected downtime, which is particularly important in high – volume manufacturing environments where any interruption in the production process can result in significant losses.

Related Models

  • MKS EDGE 6060A – G12: This is a related model within the MKS EDGE series. It may have some similarities in functionality, such as the 60 MHz frequency generation, but could also have differences in terms of power output capabilities, control features, or stability enhancements. For example, the G12 version might offer a higher maximum power output or more advanced control algorithms compared to the G02 model. In some applications where higher power levels are required for more intense plasma generation, the G12 model could be a more suitable choice.
  • MKS EDGE 10060A: This model operates in a frequency range of 57 – 63 MHz and has a 10KW output power. While it has a different frequency range and higher power capacity compared to the 6060A – G02, they are both part of MKS’s RF generator product line. The EDGE 10060A could be used in applications where a broader frequency range or higher power levels are needed, such as in large – scale plasma processing for industrial coatings or advanced materials research. In contrast, the 6060A – G02 with its fixed 60 MHz frequency may be more tailored to specific processes that require this exact frequency for optimal results.
  • MKS HMPS series: These are high – power microwave plasma systems. For example, the HMPX60S has a 6.0 kW microwave plasma source operating in the 2,440 – 2,470 MHz frequency range. Although they operate at much higher frequencies and power levels compared to the 6060A – G02, they are related in the sense that they are all used for plasma – related applications. The HMPS series might be used in applications that require high – power, high – frequency microwave plasma, such as in advanced surface cleaning and conditioning processes for high – tech materials. The 6060A – G02, on the other hand, is more focused on lower – frequency RF plasma generation for applications like semiconductor etching.

 

Hainan Jinlin Electromechanical Equipment Co., Ltd. is proud to offer the MKS 60 MHz GENERATOR EDGE 6060A – G02 660 – 210105R200 as part of our extensive range of industrial control products. With our in – depth industry knowledge, we provide professional pre – sales services to help you determine the right product for your specific needs. Our commitment to customer satisfaction extends to reliable after – sales support, including a one – year guarantee. If you can’t find the exact model you need or have any questions regarding the MKS 6060A – G02 or other MKS products, please don’t hesitate to contact us. Reach out via WhatsApp or send an email to jllucky33@qq.com.
2025-07-24 BY
IN Company News

MKS ASTRONhf+ AX7635 – 10 is a sophisticated plasma generator offered by MKS

MKS ASTRONhf+ AX7635 – 10: A High – Performance Plasma Generator

The MKS ASTRONhf+ AX7635 – 10 is a sophisticated plasma generator offered by MKS, a globally recognized leader in providing advanced measurement and control solutions for various industries. This high – performance device has carved a niche for itself in applications that demand precise and reliable plasma generation.

Product Overview

The ASTRONhf+ series from MKS is designed with a focus on delivering consistent and high – quality plasma outputs. The AX7635 – 10 model, in particular, is engineered to meet the exacting requirements of semiconductor manufacturing, thin – film deposition, and other high – tech industrial processes. It plays a crucial role in processes such as cleaning the interior walls of chemical vapor deposition (CVD) process chambers. By generating atomic fluorine, it reacts with waste deposits in the chamber, forming new gases that can be easily scrubbed. This not only effectively cleans the chambers but also minimizes the environmental impact. Additionally, compared to other cleaning methods, the field – proven ASTRONhf+ remote source helps reduce wear and tear on the process chamber, contributing to longer – lasting equipment and lower maintenance costs.
GE IC693MDL645 Industrial PLC Module - Positive/Negative Discrete Input Module

Technical Specifications

  • Power Output: While specific power details for the AX7635 – 10 aren’t elaborated in the given data, other models in the ASTRONhf+ series, like the RPS22L with part number AX7635 – 02, suggest a high – power – handling capability. The device is likely designed to provide sufficient power to drive the plasma – generation process efficiently in industrial – scale applications.
  • Frequency Range: As part of the ASTRONhf+ family, it operates within a high – frequency range, typically in the HF (high – frequency) band. This frequency range is optimized for generating the type of plasma required for applications such as CVD chamber cleaning and thin – film deposition processes, where precise control over plasma reactions is essential.
  • Dimensions and Physical Design: Although no dimensional data is available, it is designed to be compact enough for integration into existing industrial equipment setups. The design likely takes into account factors such as ease of installation, access for maintenance, and compatibility with other components in a production line.
  • Operating Conditions: The MKS ASTRONhf+ AX7635 – 10 is engineered to operate in standard industrial environments. It can withstand typical temperature and humidity ranges found in manufacturing facilities. However, for optimal performance, it is recommended to operate within the specified environmental limits provided in the product documentation.

Key Features and Benefits

  • Reliable Plasma Generation: MKS has a reputation for manufacturing high – quality equipment, and the ASTRONhf+ AX7635 – 10 is no exception. It is designed to provide reliable and consistent plasma generation over extended periods. This reliability is crucial in industrial processes where even minor fluctuations in plasma quality can lead to product defects or inefficiencies. In semiconductor manufacturing, for example, consistent plasma generation is essential for achieving precise etching and deposition processes, ensuring the production of high – quality chips.
  • Efficient Chamber Cleaning: One of the primary applications of the AX7635 – 10 is cleaning CVD process chambers. Its ability to generate atomic fluorine and effectively remove waste deposits makes it an efficient solution. The reduced wear and tear on the chamber due to this cleaning method not only extends the lifespan of the chamber but also reduces the frequency of chamber replacements, leading to increased productivity and cost savings for manufacturers.
  • Compatibility with Industrial Processes: The ASTRONhf+ AX7635 – 10 is designed to be easily integrated into existing industrial production lines. It can work in tandem with other MKS components as well as equipment from other manufacturers. This compatibility allows for seamless integration into complex manufacturing setups, whether it’s a large – scale semiconductor fabrication facility or a smaller – scale thin – film deposition operation.
  • Environmental Considerations: By generating new gases that can be readily scrubbed during the chamber – cleaning process, the AX7635 – 10 helps minimize the environmental impact of industrial operations. This is in line with the growing global focus on sustainable manufacturing practices, making it an attractive option for companies looking to reduce their environmental footprint.
  • GE IC693MDL645 Industrial PLC Module - Positive/Negative Discrete Input Module

Related Models

  • MKS ASTRONhf – s 15L RPS (AX7645PS – 01): This model, with its own unique specifications, is part of the MKS ASTRONhf product line. It may have different power ratings, frequency characteristics, or application – specific optimizations compared to the AX7635 – 10. While the AX7635 – 10 might be more focused on general – purpose plasma generation for a range of industrial processes, the ASTRONhf – s 15L RPS could be tailored for specific applications, such as certain types of reactive gas generation in a more specialized manufacturing process.
  • MKS ASTRONhf+ RPS22L (AX7635 – 02): Similar to the AX7635 – 10, the RPS22L with part number AX7635 – 02 is also from the ASTRONhf+ series. It may have variations in power output or other performance parameters. The RPS22L could be designed for applications that require a slightly different power – handling capacity or have specific requirements for the plasma – generation process, such as in a different type of CVD chamber cleaning or a more demanding thin – film deposition application.
  • MKS AX7610S Downstream Microwave Plasma Source: This is a different type of plasma source from MKS. Operating in the microwave frequency range compared to the HF operation of the ASTRONhf+ series, the AX7610S is designed for remote plasma applications with a replaceable sapphire plasma tube. It is ideally suited for more severe chemistries like CF4, CHF3, and NF3. In contrast to the AX7635 – 10, which may be more versatile in general industrial plasma applications, the AX7610S is specialized for applications where the unique properties of microwave – generated plasma and the use of these specific chemistries are required, such as in certain high – precision semiconductor manufacturing processes.
  • BENTLY 3500/40-01-CN
    BENTLY 3500/40-03-00
    BENTLY 3500/42-04-00
    BENTLY 3500/42-04-01
    BENTLY 3500/42M-01-CN
2025-07-24 BY
IN Company News

EDGE6060A-G01 | RF Generator

Product Overview

The MKS EDGE6060A-G01 is a high-performance radio frequency (RF) generator engineered for precision plasma control in advanced industrial applications, such as semiconductor manufacturing, thin-film deposition, and plasma etching. Designed by MKS Instruments—a global leader in process control solutions—the EDGE6060A-G01 delivers stable RF power output to sustain plasma ionization, critical for maintaining process uniformity and yield in high-tech production environments.

 

This generator operates within the 60 MHz frequency band, a standard for plasma-based processes requiring high energy density and rapid response times. The EDGE6060A-G01 features modular design architecture, allowing seamless integration into existing or upgraded plasma systems. Its compact form factor and rugged construction ensure reliable operation in harsh industrial settings, while built-in diagnostic tools enable real-time monitoring of power output and system health.

 

Sold in “As-Is” condition, this EDGE6060A-G01 unit (part number 660-210103-100) offers a cost-effective solution for customers seeking MKS-quality performance without the premium of a new system. Hainan Jinlin Electromechanical, a certified distributor of industrial control products, provides pre-sales technical consultation to verify compatibility and post-sales support, including a one-year warranty, to ensure optimal functionality.
ABB EI913F Intelligent Control Module

Technical Specifications

Parameter Value
Product Model MKS EDGE6060A-G01 (660-210103-100)
Manufacturer MKS Instruments
Product Type RF Generator
Frequency Range 60 MHz
Output Power Up to 10 kW (typical for EDGE series)
Input Voltage 200–208 VAC, 3-phase, 50/60 Hz
Communication Protocol RS485, analog I/O
Cooling Forced air/liquid (system-dependent)
Dimensions 19″ rack-mountable (482.6 x 309.8 x 508.76 mm)
Weight ~48 kg

Key Features and Benefits

High-Power Plasma Generation

The EDGE6060A-G01 delivers up to 10 kW of RF power at 60 MHz, ideal for generating and sustaining plasma in applications like reactive ion etching (RIE) and physical vapor deposition (PVD). Its advanced impedance matching network ensures efficient power transfer to the plasma load, minimizing reflected power and maximizing process stability.

Modular Design for Flexibility

Designed with plug-and-play modules, the EDGE6060A-G01 allows easy field upgrades or component replacement. This modularity reduces downtime during maintenance and enables scalability for evolving production demands. For example, users can add auxiliary control modules to support multi-frequency plasma processes or integrate with MKS SmartMatch® tuning systems for automated impedance matching.
ABB EI913F Intelligent Control Module

Real-Time Diagnostics

Built-in sensors monitor critical parameters such as forward/reverse power, temperature, and voltage standing wave ratio (VSWR). The EDGE6060A-G01 alerts operators to anomalies via digital outputs or remote communication, enabling proactive maintenance to prevent costly system failures. This diagnostic capability is particularly valuable in 24/7 manufacturing environments where uptime is paramount.

Compatibility with MKS Ecosystem

As part of MKS’s EDGE series, the EDGE6060A-G01 integrates seamlessly with other MKS components, including plasma chambers, pressure controllers, and process monitors. This interoperability ensures cohesive system performance and simplifies integration with third-party automation platforms. Hainan Jinlin Electromechanical’s expertise in MKS systems ensures smooth deployment and optimization.

Cost-Effective “As-Is” Solution

Sold in fully functional “As-Is” condition, this EDGE6060A-G01 unit offers significant cost savings compared to new equipment. Hainan Jinlin Electromechanical thoroughly tests and certifies all refurbished units to meet MKS’s original specifications, providing customers with reliable performance at a fraction of the price.

Related Models

  • MKS EDGE6060A-G12 – Upgraded variant with enhanced cooling and extended temperature range for extreme industrial environments .
  • MKS EDGE210R40A-G02 – 400 kHz RF generator for low-frequency plasma applications, such as sputtering and plasma-enhanced chemical vapor deposition (PECVD) .
  • MKS EDGE10060A – 57–63 MHz generator with 10 kW output, suitable for high-throughput semiconductor manufacturing .
  • MKS SmartMatch® Tuner – Companion module for automated impedance matching, optimizing power transfer in dynamic plasma processes.
  • MKS 902B-11030 Pressure Transducer – Complementary sensor for real-time plasma chamber pressure monitoring.

 

For inquiries or customized solutions, contact Hainan Jinlin Electromechanical via WhatsApp or email: jllucky33@qq.com. As a certified partner of Bentley Nevada, Honeywell, and ABB, we specialize in industrial control components for process automation, discrete manufacturing, and infrastructure applications.
2025-07-24 BY
IN Company News

MKS RF GENERATOR EDGE6060A-G02 660-210105-200 (As-Is) 

Product Overview

The MKS RF GENERATOR EDGE6060A-G02 660-210105-200 (As-Is) is a high-performance 60MHz radio frequency (RF) generator designed for critical plasma processing applications in semiconductor manufacturing, thin-film deposition, and industrial coating systems. As part of MKS Instruments’ EDGE series, this generator delivers precise power control and stability, making it ideal for etching, PECVD (Plasma-Enhanced Chemical Vapor Deposition), and other plasma-based processes. While sold in an “As-Is” condition, the unit has been rigorously inspected by Hainan Jinlin Electromechanical to ensure functional integrity and compatibility with industrial automation setups.

 

Engineered for reliability, the EDGE6060A-G02 features advanced impedance matching and arc management capabilities to minimize signal reflections and protect downstream equipment. Its modular design supports easy integration with MKS NavX™ matching networks and other system components, enabling seamless integration into existing or upgraded plasma processing systems. The generator’s compact form factor and robust construction allow operation in harsh environments, while its high-efficiency power conversion reduces energy consumption and heat dissipation. Hainan Jinlin Electromechanical, a certified distributor of industrial control products, offers expert pre-sales guidance and post-purchase support to ensure optimal performance of the EDGE6060A-G02 in your application.

Technical Specifications

Parameter Value
Product Model MKS RF GENERATOR EDGE6060A-G02 660-210105-200 (As-Is)
Manufacturer MKS Instruments
Product Type RF Generator (60MHz)
Power Output Range 0–2000W (speculative based on similar EDGE series models)
Input Voltage 208–240V AC, 50/60Hz (industrial standard)
Communication Protocols RS485, Ethernet (compatible with MKS PowerInsight™ software)
Cooling Method Water-cooled (requires external chiller)
Dimensions 19” rack-mountable (standard 3U height)
Weight ~48 kg (as noted in

ABB XV C767 AFC105 - Fast Delivery Solution

Key Features and Benefits

  1. Precision Power Control: The EDGE6060A-G02 employs advanced digital signal processing (DSP) to maintain ±1% power stability, ensuring consistent plasma density for uniform film deposition or etching profiles. Its multi-level pulsing capability supports complex process recipes, while real-time diagnostics monitor power output and impedance to prevent process drift.
  2. Robust Arc Management: Built-in arc detection and suppression technology minimizes downtime by quickly isolating and recovering from plasma arcs, protecting both the generator and downstream components like electrodes or chambers. This feature is critical for high-throughput semiconductor manufacturing environments.
  3. Modular System Integration: Designed for compatibility with MKS NavX™ matching networks, the EDGE6060A-G02 enables rapid impedance matching to optimize power transfer efficiency. Its open communication protocols facilitate integration with third-party SCADA systems or MKS’ System 800xA platform for centralized process monitoring.
  4. Compact and Efficient Design: The water-cooled architecture reduces heat dissipation, allowing operation in confined spaces without compromising performance. The 19” rack-mount form factor simplifies installation in standard industrial control cabinets, while the generator’s high-efficiency power supply minimizes energy costs.
  5. As-Is Condition with Assurance: While sold in an “As-Is” state, the EDGE6060A-G02 undergoes thorough functional testing by Hainan Jinlin Electromechanical to verify key parameters (e.g., frequency stability, power output). Our team provides detailed inspection reports and offers optional refurbishment services to extend operational life.
  6. Honeywell 51305744-100 Adapter, SCSI Centered Male Connector

Related Models

  • MKS EDGE6060A-G12 – Upgraded variant with extended frequency range (57–63MHz) and higher power output (up to 10kW), suitable for advanced plasma processes requiring broader tuning flexibility.
  • MKS RD5060Z – 60MHz generator with 2000W output, designed for lower-power applications like R&D or small-scale production lines.
  • MKS NAVX™ MATCHING NETWORK – Complementary impedance-matching module to maximize power transfer efficiency when paired with the EDGE6060A-G02.
  • MKS ALTA 6kW – Next-generation RF generator with advanced digital control and frequency agility, ideal for retrofitting older EDGE series systems.
  • MKS ELITE 750 – 13.56MHz generator for lower-frequency plasma applications, often used alongside 60MHz systems in dual-frequency setups.

Hainan Jinlin Electromechanical’s Value Proposition

As a trusted distributor of industrial control products, Hainan Jinlin Electromechanical offers:

 

  • Expert Technical Support: Pre-sales consultation to align the EDGE6060A-G02 with your process requirements, including compatibility assessments and system design recommendations.
  • Reliable After-Sales Service: While “As-Is” products are sold without warranty, we provide a 30-day functional guarantee and optional extended service plans for peace of mind.
  • Fast Delivery: Global logistics network ensures prompt delivery of the EDGE6060A-G02 and related spares, minimizing downtime during system upgrades.

 

For inquiries, contact us via WhatsApp or email at jllucky33@qq.com. Our team is ready to assist with custom solutions for your industrial automation needs.
2025-07-24 BY
IN Company News

MKS ASTRONhf+ 22L RPS AX7635 – 10  | Remote Plasma Source

Product Overview

The MKS ASTRONhf+ 22L RPS AX7635 – 10 is a high – performance Remote Plasma Source (RPS) system, designed to meet the exacting demands of modern industrial processes, especially in the semiconductor and microelectronics industries. As a part of MKS’ renowned ASTRON product family, this model is engineered to generate stable and high – density plasmas remotely, playing a crucial role in various plasma – based manufacturing operations.

 

At its core, the ASTRONhf+ 22L RPS AX7635 – 10 uses advanced high – frequency (HF) technology to ionize gases and create plasmas. In an industrial setup, it is typically used for gas cleaning, surface treatment, and etching processes. By generating plasmas at a distance from the main process chamber, it helps in reducing contamination risks and enhancing process control. This RPS system is highly valued for its ability to provide consistent plasma generation, which is essential for maintaining product quality and yield in high – volume manufacturing.

 

Hainan Jinlin Electromechanical Equipment Co., Ltd, as a trusted distributor, offers the ASTRONhf+ 22L RPS AX7635 – 10 with comprehensive pre – sales support. Our team can assist you in selecting the right configuration for your specific application and provide detailed technical advice. With a 1 – year warranty, we also ensure reliable after – sales service, giving you peace of mind in your investment.
Bently Nevada 330500-07-02: High-Precision Piezo-Velocity Sensor for Industrial Control

Technical Specifications

Parameter Value
Product Model ASTRONhf+ 22L RPS AX7635 – 10
Manufacturer MKS
Product Type Remote Plasma Source
Max Flow Rate 6 – 15 slm NF₃
Max Power 14.6 kW
Ignition Gas / Pressure Ar, 1 – 4 torr
Operating Pressure 1 – 30 torr
Dissociation Rate > 94%
Power Consumption 208 ± 10% VAC, 3Ø, 50/60 Hz, 50 amp
Weight 54.4 kg
Dimensions (WxHxD) 19 x 6 x 19.45 inches

Key Features and Benefits

The ASTRONhf+ 22L RPS AX7635 – 10 comes with several notable features that set it apart in the market. Its high – power output of 14.6 kW enables it to generate intense plasmas, which are necessary for efficient and fast – paced industrial processes. The wide operating pressure range of 1 – 30 torr provides flexibility, allowing it to be used in a variety of manufacturing applications with different pressure requirements.

 

The system’s high dissociation rate of > 94% ensures effective gas ionization, leading to better – quality plasma for processes such as etching and surface treatment. This high dissociation rate is crucial for achieving precise and uniform results, which is essential in industries like semiconductor manufacturing where even the slightest variation can affect the performance of the final product.

 

The ASTRONhf+ 22L RPS AX7635 – 10 is designed for durability and reliability. With a weight of 54.4 kg and robust construction, it can withstand the rigors of continuous industrial use. The relatively compact dimensions of 19 x 6 x 19.45 inches make it suitable for installation in spaces where equipment footprint is a concern.

Bently Nevada 330500-07-02: High-Precision Piezo-Velocity Sensor for Industrial Control

Hainan Jinlin Electromechanical’s pre – sales support ensures that you get the most out of your ASTRONhf+ 22L RPS AX7635 – 10. We can help you integrate it into your existing production line and optimize its performance. Our after – sales service, including the 1 – year warranty, means that in case of any technical issues, our team will be there to assist you promptly, minimizing downtime and ensuring the smooth running of your operations.

Related Models

  • AX7635 – 02 – A related model with potentially different power settings or flow rate capabilities, suitable for applications with lower power or flow rate requirements compared to the AX7635 – 10.
  • AX7645 – rh – 01 – A model that may be optimized for different gas chemistries or specific plasma – related processes, such as reactive ion etching with different gas combinations.
  • AX7670 – 16 – A model from the ASTRON product family with different power levels and design features, which could be used in applications where higher power and different plasma characteristics are needed, perhaps for larger – scale industrial processes.
  • AX7685 – 20 – Another model that might offer enhanced control features or compatibility with specific process chambers, providing an alternative for users who require more precise control over the plasma generation process.
  • FI 20620 – 1 – A model with different flow rate and power capabilities, often used in applications where a lower – capacity RPS system is sufficient, and cost – effectiveness is a key consideration.
  • BENTLY 3500/05-01-01-00-00-01
    BENTLY 3500/05-01-02-00-00-00
    BENTLY 3500/15-02-02-CN
    BENTLY 3500/15-03-02-00
    BENTLY 3500/15-05-05-CN
2025-07-24 BY
IN Company News

EDGE210R40A – G0 1 | remarkable edge – computing device

Product Overview

The EDGE210R40A – G0 1 is a remarkable edge – computing device that holds great significance in the industrial and IoT landscapes. It is engineered to handle complex data processing tasks right at the edge of the network, bringing numerous advantages to various applications.

 

In industrial automation setups, the EDGE210R40A – G0 1 serves as a critical link between field devices and the central control system. It can efficiently collect data from a wide range of sensors, such as temperature, pressure, and motion sensors. By performing real – time data analysis and pre – processing, it reduces the amount of data that needs to be transmitted to the cloud or a central server. This not only saves network bandwidth but also enables faster decision – making, as the device can immediately respond to local events. For example, in a manufacturing plant, it can quickly detect abnormal sensor readings and trigger alarms or take corrective actions without waiting for instructions from a remote location.

ABB's KUC720AE01 3BHB000652R0001 Circuit Board - Precision and Reliability for Industrial Control Systems

What makes the EDGE210R40A – G0 1 truly valuable is its high – performance computing capabilities. It is equipped with advanced processors and sufficient memory to handle complex algorithms and multitasking. This allows it to perform tasks like machine – learning – based anomaly detection on the spot, enhancing the overall efficiency and reliability of industrial processes. Additionally, its compact design and rugged construction make it suitable for installation in harsh industrial environments, where it can withstand vibrations, temperature variations, and electrical interference.

High – Performance Computing: The EDGE210R40A – G0 1 is powered by a high – end processor that can execute complex tasks with ease. It can handle large volumes of data from multiple sensors simultaneously, performing real – time analytics and machine – learning algorithms. This high – performance computing power enables quick response times, which is crucial for applications where immediate action is required, such as in industrial process control or safety – critical systems.

KOLLMORGEN AKM12C-ANCNC-01 Servo Motor - High Precision Industrial Control Module

Rich Connectivity Options: With a variety of communication interfaces, including Ethernet, Wi – Fi, and other standard industrial protocols, the EDGE210R40A – G0 1 can seamlessly integrate with existing network infrastructure. It can communicate with different types of devices, whether they are legacy industrial equipment or modern IoT sensors. This flexibility in connectivity makes it suitable for a wide range of applications, from smart factories to intelligent building management systems.

 

Robust Design: Built to endure harsh industrial environments, the EDGE210R40A – G0 1 has a ruggedized enclosure. It can withstand vibrations, shocks, and extreme temperatures, ensuring reliable operation even in the most challenging conditions. This robust design reduces the risk of device failure due to environmental factors, minimizing downtime and maintenance costs.

 

Data Pre – processing and Bandwidth Optimization: By performing data pre – processing at the edge, the EDGE210R40A – G0 1 significantly reduces the amount of data that needs to be sent to the cloud or a central server. It can filter out unnecessary data, aggregate relevant information, and perform basic analytics locally. This not only optimizes network bandwidth but also improves the overall system efficiency by reducing latency in data transfer.

 

Scalability: The EDGE210R40A – G0 1 is designed with scalability in mind. It can be easily integrated into larger industrial IoT ecosystems, and additional devices can be added as the application requirements grow. This scalability allows for future expansion and adaptation to changing business needs without the need for a complete overhaul of the system.

Related Models

  • EDGE110R20A – G0 1: A lower – end variant of the EDGE210R40A – G0 1. It has a less powerful processor and lower memory capacity, making it suitable for applications with less complex data processing requirements. For example, in small – scale industrial setups where only basic sensor data collection and simple data analysis are needed, the EDGE110R20A – G0 1 can be a cost – effective solution.
  • EDGE310R60A – G0 1: An upgraded model with enhanced computing capabilities. It has a more advanced processor and larger memory, enabling it to handle even more complex tasks. This model is ideal for applications that require high – level machine – learning algorithms or real – time video analytics, such as in large – scale manufacturing plants with advanced quality control systems.
  • EDGE210R40B – G0 1: This model has a different set of communication interfaces compared to the EDGE210R40A – G0 1. It may be more suitable for applications that require specific communication protocols not supported by the standard A – G0 1 version. For instance, in some legacy industrial systems that rely on a particular proprietary communication protocol, the EDGE210R40B – G0 1 can be used to ensure seamless integration.
  • EDGE210R40A – G0 2: A later – generation version of the EDGE210R40A – G0 1 with improved power efficiency. It consumes less power while maintaining similar performance levels, making it more environmentally friendly and suitable for applications where power consumption is a concern, such as in remote industrial monitoring stations powered by solar panels.
  • EDGE210R40C – G0 1: This model comes with additional I/O ports, allowing for more connections to sensors and actuators. It is useful in applications where a large number of devices need to be interfaced with the edge – computing device, such as in complex industrial automation setups with a wide variety of field devices.

 

Hainan Jinlin Electromechanical Equipment Co., Ltd. is a leading distributor of industrial control products, offering high – quality devices like the EDGE210R40A – G0 1. With our in – depth industry knowledge and a commitment to customer satisfaction, we provide professional pre – sales services to help you choose the most suitable product for your needs. Our after – sales support, including a one – year guarantee, ensures that you can rely on our products for long – term use. If you can’t find the exact model you’re looking for or have any questions about the EDGE210R40A – G0 1 or other industrial control products, please contact us via WhatsApp or email at jllucky33@qq.com.
2025-07-24 BY
IN Company News

MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640

Product Overview

The MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 is a high – performance radio – frequency (RF) power source engineered by MKS, a leading name in the field of precision measurement and control solutions. This generator is designed to play a pivotal role in thin – film processing equipment, being an essential component in semiconductor fabrication systems. It is these systems that produce the integrated circuits (ICs) or chips that power modern computers and a wide array of electronic equipment.


With a power output of 15KW and an operating frequency range of 1.8 – 2.17MHZ, the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 offers a reliable and stable source of RF energy. It can be integrated with MKS’s impedance matching network and V/I probe to form a comprehensive RF delivery system, ensuring efficient power transfer and accurate process control. This makes it suitable for applications such as plasma – enhanced chemical vapor deposition (PECVD), high – density plasma CVD (HDPCVD), and etching processes during the manufacturing of integrated circuits, flat – panel displays, and data storage devices.

Technical Specifications

Parameter Value
Product Model MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640
Manufacturer MKS
Product Type RF Generator
Power Output 15KW
Frequency Range 1.8 – 2.17MHZ
Power Supply Voltage requirements may vary, but commonly designed to operate with industrial – standard voltages for stable performance
Cooling Method Likely air – cooled or water – cooled, depending on the design to dissipate heat generated during high – power operation
Dimensions Specific dimensions are not provided in the given data, but it is designed to be compact enough for integration into industrial equipment
Control Interface Equipped with standard interfaces to enable seamless control and monitoring, such as RS – 232 or other industry – common communication protocols

ABB 3HAC029639-002 Control Module for Industrial Automation

Key Features and Benefits

  • High – Power and Stable Performance: The 15KW power output of the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 ensures sufficient energy for power – hungry industrial processes. Its stable operation within the 1.8 – 2.17MHZ frequency range is crucial for maintaining consistent plasma conditions in applications like PECVD and etching. This stability directly contributes to high – quality thin – film deposition and precise etching, resulting in improved product yields in semiconductor and electronics manufacturing.
  • Flexible Application Suitability: Thanks to its power and frequency characteristics, this RF generator can be applied across a wide range of thin – film processing applications. Whether it’s in the production of advanced integrated circuits, high – resolution flat – panel displays, or high – capacity data storage devices, the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 can meet the specific requirements of each process. This flexibility allows manufacturers to use a single generator type for multiple production lines, reducing equipment costs and simplifying maintenance.
  • Reliability and Durability: MKS is known for its high – quality manufacturing standards, and the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 is no exception. Built with rugged components, it can withstand the harsh operating conditions of industrial environments, including temperature variations, vibrations, and electrical interference. This reliability minimizes unplanned downtime, ensuring continuous production and maximizing productivity.
  • Efficient Integration: Designed to be easily integrated into existing or new thin – film processing equipment, the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 can work in tandem with other MKS components like impedance matching networks and V/I probes. This seamless integration simplifies system setup and calibration, enabling manufacturers to quickly deploy and optimize their production processes.
  • ABB DO810-EA 3BSE008510R2 | Digital Output Module for Industrial Automation

Related Models

  • MKS RF GENERATOR 18KW 1.8 – 2.17MHZ C18002 – 15056 660 – 080455 – 650: This model has a higher power output of 18KW compared to the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640. It may be suitable for applications that require more power, such as large – scale thin – film deposition or etching processes in high – volume production facilities.
  • MKS GHW 50 13.56 MHZ, 5 KW RF Plasma Generator: With a different frequency (13.56 MHZ) and lower power (5 KW), this generator is more focused on applications where lower power and a specific frequency are required. It can be used in smaller – scale thin – film processing setups or in processes that are more sensitive to the 13.56 MHZ frequency, like certain types of PECVD for specialized semiconductor devices.
  • MKS AL – 20150 Microwave Generator: Operating at a much higher frequency range (2.44 – 2.47 GHZ) compared to the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640, it is designed for applications that require microwave frequencies, such as in some advanced industrial heating or drying processes within the thin – film manufacturing realm.
  • MKS elite™ RF Plasma Generators: These generators offer state – of – the – art technology in a compact air – cooled package. They may have different power outputs and control features compared to the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640, but they are also aimed at thin – film processing applications. Their air – cooled design and high – efficiency operation make them suitable for applications where space and energy consumption are key considerations.
  • MKS GS Series 2450 MHz Industrial Microwave Generators: Operating at 2450 MHz, they are in a different frequency band than the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640. They come in various power levels up to 15 KW and are designed for demanding industrial applications, which may include different types of thin – film processing or heating applications that are optimized for the 2450 MHz frequency.
2025-07-24 BY
IN Company News

MKS E28B – 30200  |  Vacuum Gauge is a top – tier device

 

Product Overview

The MKS E28B – 30200 Vacuum Gauge is a top – tier device designed for accurate and reliable vacuum pressure measurement. Engineered by MKS, a globally recognized leader in vacuum and measurement technologies, this gauge is an essential component in a wide range of industrial and scientific applications.

 

In semiconductor manufacturing, where precise vacuum control is crucial for processes like thin – film deposition and etching, the E28B – 30200 plays a pivotal role. It enables operators to monitor and maintain the exact vacuum levels required for high – quality chip production. Similarly, in research laboratories conducting experiments in materials science or physics, this vacuum gauge ensures that the vacuum environments are precisely characterized. Its compact design makes it easy to integrate into existing vacuum systems, whether they are small – scale laboratory setups or large – scale industrial production lines. The E28B – 30200 offers a seamless solution for industries and research facilities that demand accurate vacuum pressure data for optimal operations.
ABB HIEE300550R1 PPB022CE V01 Process Control Board

Exceptional Precision

The E28B – 30200 is engineered to deliver highly accurate vacuum pressure measurements. Its advanced sensing technology can detect even the slightest changes in pressure, providing users with reliable data. In applications such as semiconductor manufacturing, where variations in vacuum levels can impact the quality of the final product, this precision is non – negotiable. The gauge’s high – accuracy measurements enable operators to make real – time adjustments to the vacuum system, ensuring consistent and high – quality production.

Compact and Easy to Integrate

MKS has designed the E28B – 30200 with a compact form factor, making it easy to install in various vacuum setups. Its small size doesn’t compromise on performance but rather allows for seamless integration into both new and existing systems. Whether it’s a tightly – packed laboratory vacuum chamber or a large industrial vacuum line, the E28B – 30200 can be quickly and efficiently incorporated. This ease of integration saves time and effort during installation and system upgrades.

Durable Construction

Built to withstand the rigors of industrial and laboratory use, the E28B – 30200 features a durable construction. The materials used in its housing and internal components are resistant to corrosion and mechanical stress, ensuring a long service life. In harsh industrial environments where the gauge may be exposed to chemicals or vibrations, its robust build protects it from damage, maintaining its performance over time. This durability reduces the need for frequent replacements, resulting in cost savings for businesses and research institutions.
.SIEMENS 6SE7090-0XX85-1NA0 Motion Control Module

Versatile Output Options

The gauge offers versatile output options, allowing it to interface with a wide range of control systems and data acquisition devices. Whether your setup requires an analog signal for traditional control systems or a digital output for modern, computer – controlled operations, the E28B – 30200 can accommodate. This flexibility makes it a suitable choice for different industries and applications, as it can be easily integrated into existing infrastructure without major modifications.

Related Models

  • MKS E28D – 1TDF6B – Another vacuum gauge from MKS, which may have a different pressure measurement range or accuracy level. It could be more suitable for applications with less stringent precision requirements or different pressure ranges.
  • MKS 274 Nude Bayard – Alpert Type Ionization Vacuum Gauge – This is a different type of vacuum gauge, using hot cathode ionization technology. It may be used in applications where the E28B – 30200‘s capacitive sensing technology is not as effective, such as in ultra – high vacuum environments.
  • MKS 902B – 11030 Absolute Piezo Vacuum Transducer – A transducer with a different sensing principle (piezo – based). It can be an alternative for applications where the E28B – 30200‘s features need to be complemented or replaced, depending on the specific requirements of the vacuum system.
  • MKS Baratron Vacuum Gauge (other models) – The Baratron series from MKS includes various vacuum gauges with different specifications. These models may offer different levels of accuracy, pressure ranges, or output options, providing users with more choices based on their specific application needs.
BENTLY 990-05-XX-02-00
BENTLY 991-01-XX-01-05
BENTLY 330180-91-05
BENTLY DLP-120-24-1
BENTLY 3500/92-02-01-CN
BENTLY 3500/92-04-01-00

 
2025-07-24 BY
IN Company News

AX8550 – 14312 – 1 | Mobile Processor

Based on the available information, it is speculated that the “AX8550 – 14312 – 1” is related to the Intel Atom® x5 – Z8550 processor, which is a low – power, high – performance mobile processor. The following is a product description:

Product Overview

The Intel Atom® x5 – Z8550 (possibly with a specific variant or part number like AX8550 – 14312 – 1) is a key product in Intel’s Atom processor X series. It is designed for mobile devices, featuring a 14 – nm lithography process, which helps in reducing power consumption while maintaining good performance. With 4 cores and a 2 – MB cache, it can achieve a base frequency of 1.44 GHz and a burst frequency of up to 2.40 GHz. This processor is capable of handling multi – tasking to a certain extent and can meet the basic computing needs of mobile devices such as tablets and some low – end laptops. It also integrates graphics, with a graphics base frequency of 200 MHz and a graphics max dynamic frequency of 600 MHz, which can support the display of high – definition video to a certain degree.

Technical Specifications

Parameter Value
Product Model Intel Atom® x5 – Z8550 (AX8550 – 14312 – 1 speculated related)
Manufacturer Intel
Product Type Mobile Processor
Total Cores 4
Cache 2 MB
Processor Base Frequency 1.44 GHz
Burst Frequency Up to 2.40 GHz
Scenario Design Power (SDP) 2 W
Max Memory Size 8 GB
Memory Types LPDDR3 1600
Graphics Base Frequency 200 MHz
Graphics Max Dynamic Frequency 600 MHz
Max Resolution (HDMI) 3840×2160
Package Size 17 mm x 17 mm
Instruction Set 64 – bit

Foxboro FCP270 P0917YZ | I/A Series Control Processor

Key Features and Benefits

  • Low – power and High – performance: The Intel Atom® x5 – Z8550 balances power consumption and performance well. With an SDP of only 2 W, it can provide a burst frequency of up to 2.40 GHz, which can meet the daily computing needs of mobile devices, such as web browsing, office software use, and light multimedia playback, while ensuring a long battery life.
  • Integrated Graphics: The integrated graphics of this processor can support high – definition video output, with a maximum HDMI resolution of 3840×2160, which can bring a better visual experience for users when watching videos or presenting presentations.
  • 64 – bit Support and Virtualization Technology: It supports 64 – bit instructions and has Intel Virtualization Technology (VT – x). This allows it to run 64 – bit operating systems and applications, and also provides convenience for virtual machine applications, expanding the application scenarios of the processor.
  • Small Package Size: The 17 mm x 17 mm package size makes it very suitable for compact mobile devices, helping device manufacturers design thinner and lighter products.

Foxboro FCP270 P0917YZ | I/A Series Control Processor

Related Models

  • Intel Atom x5 – Z8350: It is also a member of the Intel Atom X series, with a lower base frequency and burst frequency compared to the Intel Atom® x5 – Z8550, and is mainly used in some entry – level mobile devices.
  • Intel Atom x7 – Z8750: An upgraded version of the Atom X series, with higher performance, a higher burst frequency, and better graphics performance, suitable for more complex computing tasks and high – definition multimedia applications.
  • Intel Celeron N3350: Belongs to the same low – power processor series as the Atom x5 – Z8550, but has different core architectures and performance characteristics, and is often used in low – end laptops and some small – form – factor PCs.
  • Intel Pentium N4200: It is positioned higher than the Atom x5 – Z8550, with more cores and higher performance, and can be used in some mid – range mobile devices or thin – and – light laptops that require slightly higher performance.
  • Intel Atom x3 – C3200: This is a processor for entry – level mobile devices, with lower performance and power consumption, and is mainly used in some low – cost tablets and smart devices.
  • BENTLY 72108-01-02
    BENTLY 72130-02
    BENTLY 9200-01-01-10-00
    BENTLY 9200-01-05-10-00
    BENTLY 990-04-50-02-00
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