Product Overview

The MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 is a high – performance radio – frequency (RF) power source engineered by MKS, a leading name in the field of precision measurement and control solutions. This generator is designed to play a pivotal role in thin – film processing equipment, being an essential component in semiconductor fabrication systems. It is these systems that produce the integrated circuits (ICs) or chips that power modern computers and a wide array of electronic equipment.


With a power output of 15KW and an operating frequency range of 1.8 – 2.17MHZ, the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 offers a reliable and stable source of RF energy. It can be integrated with MKS’s impedance matching network and V/I probe to form a comprehensive RF delivery system, ensuring efficient power transfer and accurate process control. This makes it suitable for applications such as plasma – enhanced chemical vapor deposition (PECVD), high – density plasma CVD (HDPCVD), and etching processes during the manufacturing of integrated circuits, flat – panel displays, and data storage devices.

Technical Specifications

Parameter Value
Product Model MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640
Manufacturer MKS
Product Type RF Generator
Power Output 15KW
Frequency Range 1.8 – 2.17MHZ
Power Supply Voltage requirements may vary, but commonly designed to operate with industrial – standard voltages for stable performance
Cooling Method Likely air – cooled or water – cooled, depending on the design to dissipate heat generated during high – power operation
Dimensions Specific dimensions are not provided in the given data, but it is designed to be compact enough for integration into industrial equipment
Control Interface Equipped with standard interfaces to enable seamless control and monitoring, such as RS – 232 or other industry – common communication protocols

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Key Features and Benefits

  • High – Power and Stable Performance: The 15KW power output of the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 ensures sufficient energy for power – hungry industrial processes. Its stable operation within the 1.8 – 2.17MHZ frequency range is crucial for maintaining consistent plasma conditions in applications like PECVD and etching. This stability directly contributes to high – quality thin – film deposition and precise etching, resulting in improved product yields in semiconductor and electronics manufacturing.
  • Flexible Application Suitability: Thanks to its power and frequency characteristics, this RF generator can be applied across a wide range of thin – film processing applications. Whether it’s in the production of advanced integrated circuits, high – resolution flat – panel displays, or high – capacity data storage devices, the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 can meet the specific requirements of each process. This flexibility allows manufacturers to use a single generator type for multiple production lines, reducing equipment costs and simplifying maintenance.
  • Reliability and Durability: MKS is known for its high – quality manufacturing standards, and the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 is no exception. Built with rugged components, it can withstand the harsh operating conditions of industrial environments, including temperature variations, vibrations, and electrical interference. This reliability minimizes unplanned downtime, ensuring continuous production and maximizing productivity.
  • Efficient Integration: Designed to be easily integrated into existing or new thin – film processing equipment, the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640 can work in tandem with other MKS components like impedance matching networks and V/I probes. This seamless integration simplifies system setup and calibration, enabling manufacturers to quickly deploy and optimize their production processes.
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Related Models

  • MKS RF GENERATOR 18KW 1.8 – 2.17MHZ C18002 – 15056 660 – 080455 – 650: This model has a higher power output of 18KW compared to the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640. It may be suitable for applications that require more power, such as large – scale thin – film deposition or etching processes in high – volume production facilities.
  • MKS GHW 50 13.56 MHZ, 5 KW RF Plasma Generator: With a different frequency (13.56 MHZ) and lower power (5 KW), this generator is more focused on applications where lower power and a specific frequency are required. It can be used in smaller – scale thin – film processing setups or in processes that are more sensitive to the 13.56 MHZ frequency, like certain types of PECVD for specialized semiconductor devices.
  • MKS AL – 20150 Microwave Generator: Operating at a much higher frequency range (2.44 – 2.47 GHZ) compared to the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640, it is designed for applications that require microwave frequencies, such as in some advanced industrial heating or drying processes within the thin – film manufacturing realm.
  • MKS elite™ RF Plasma Generators: These generators offer state – of – the – art technology in a compact air – cooled package. They may have different power outputs and control features compared to the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640, but they are also aimed at thin – film processing applications. Their air – cooled design and high – efficiency operation make them suitable for applications where space and energy consumption are key considerations.
  • MKS GS Series 2450 MHz Industrial Microwave Generators: Operating at 2450 MHz, they are in a different frequency band than the MKS RF GENERATOR 15KW 1.8 – 2.17MHZ C15002 – 05 660 – 080455 – 640. They come in various power levels up to 15 KW and are designed for demanding industrial applications, which may include different types of thin – film processing or heating applications that are optimized for the 2450 MHz frequency.