Product Overview
The MKS ASTRONhf+ 22L RPS AX7635 – 10 is a high – performance Remote Plasma Source (RPS) system, designed to meet the exacting demands of modern industrial processes, especially in the semiconductor and microelectronics industries. As a part of MKS’ renowned ASTRON product family, this model is engineered to generate stable and high – density plasmas remotely, playing a crucial role in various plasma – based manufacturing operations.
At its core, the ASTRONhf+ 22L RPS AX7635 – 10 uses advanced high – frequency (HF) technology to ionize gases and create plasmas. In an industrial setup, it is typically used for gas cleaning, surface treatment, and etching processes. By generating plasmas at a distance from the main process chamber, it helps in reducing contamination risks and enhancing process control. This RPS system is highly valued for its ability to provide consistent plasma generation, which is essential for maintaining product quality and yield in high – volume manufacturing.
Hainan Jinlin Electromechanical Equipment Co., Ltd, as a trusted distributor, offers the ASTRONhf+ 22L RPS AX7635 – 10 with comprehensive pre – sales support. Our team can assist you in selecting the right configuration for your specific application and provide detailed technical advice. With a 1 – year warranty, we also ensure reliable after – sales service, giving you peace of mind in your investment.
Technical Specifications
| Parameter | Value |
|---|---|
| Product Model | ASTRONhf+ 22L RPS AX7635 – 10 |
| Manufacturer | MKS |
| Product Type | Remote Plasma Source |
| Max Flow Rate | 6 – 15 slm NF₃ |
| Max Power | 14.6 kW |
| Ignition Gas / Pressure | Ar, 1 – 4 torr |
| Operating Pressure | 1 – 30 torr |
| Dissociation Rate | > 94% |
| Power Consumption | 208 ± 10% VAC, 3Ø, 50/60 Hz, 50 amp |
| Weight | 54.4 kg |
| Dimensions (WxHxD) | 19 x 6 x 19.45 inches |
Key Features and Benefits
The ASTRONhf+ 22L RPS AX7635 – 10 comes with several notable features that set it apart in the market. Its high – power output of 14.6 kW enables it to generate intense plasmas, which are necessary for efficient and fast – paced industrial processes. The wide operating pressure range of 1 – 30 torr provides flexibility, allowing it to be used in a variety of manufacturing applications with different pressure requirements.
The system’s high dissociation rate of > 94% ensures effective gas ionization, leading to better – quality plasma for processes such as etching and surface treatment. This high dissociation rate is crucial for achieving precise and uniform results, which is essential in industries like semiconductor manufacturing where even the slightest variation can affect the performance of the final product.
The ASTRONhf+ 22L RPS AX7635 – 10 is designed for durability and reliability. With a weight of 54.4 kg and robust construction, it can withstand the rigors of continuous industrial use. The relatively compact dimensions of 19 x 6 x 19.45 inches make it suitable for installation in spaces where equipment footprint is a concern.
Hainan Jinlin Electromechanical’s pre – sales support ensures that you get the most out of your ASTRONhf+ 22L RPS AX7635 – 10. We can help you integrate it into your existing production line and optimize its performance. Our after – sales service, including the 1 – year warranty, means that in case of any technical issues, our team will be there to assist you promptly, minimizing downtime and ensuring the smooth running of your operations.
Related Models
- AX7635 – 02 – A related model with potentially different power settings or flow rate capabilities, suitable for applications with lower power or flow rate requirements compared to the AX7635 – 10.
- AX7645 – rh – 01 – A model that may be optimized for different gas chemistries or specific plasma – related processes, such as reactive ion etching with different gas combinations.
- AX7670 – 16 – A model from the ASTRON product family with different power levels and design features, which could be used in applications where higher power and different plasma characteristics are needed, perhaps for larger – scale industrial processes.
- AX7685 – 20 – Another model that might offer enhanced control features or compatibility with specific process chambers, providing an alternative for users who require more precise control over the plasma generation process.
- FI 20620 – 1 – A model with different flow rate and power capabilities, often used in applications where a lower – capacity RPS system is sufficient, and cost – effectiveness is a key consideration.
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BENTLY 3500/05-01-01-00-00-01 BENTLY 3500/05-01-02-00-00-00 BENTLY 3500/15-02-02-CN BENTLY 3500/15-03-02-00 BENTLY 3500/15-05-05-CN
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