Product Overview

Technical Specifications

Key Features and Benefits

Related Models

• Giddings And Lewis M – 1016 – 9510 R13 – A related model that might have different processing capabilities or feature sets. For example, it could offer enhanced programmability or support for a different type of slider technology, making it suitable for more complex motion control applications compared to the Giddings And Lewis M – 1016 – 9443.
• Danaher Motion / Giddings and Lewis MMC Analog Servo Modules (various) – These modules, like the ones with 2 – axis or 4 – axis capabilities, are related in terms of their motion control functionality. While the Giddings And Lewis M – 1016 – 9443 focuses on 2 – channel slider driving, the MMC analog servo modules may have broader applications in controlling different types of drives and axes within a motion control system.
• Giddings And Lewis Serially Distributed Block I/O Modules (related models) – These I/O modules can be used in conjunction with the Giddings And Lewis M – 1016 – 9443 to expand the input and output capabilities of the overall motion control setup. They can interface with sensors and actuators, providing additional data input and control output options for a more comprehensive and flexible motion control solution.
• Giddings And Lewis Machine Control Modules (associated models) – These modules work in tandem with the Giddings And Lewis M – 1016 – 9443 in a complete machine control system. The machine control modules handle tasks such as ladder logic programming for overall machine control, while the M – 1016 – 9443 focuses on the specific task of slider driving, together creating a seamless and efficient industrial control environment.
• Giddings And Lewis M – 1016 – 9443 variants (if any) – There may be different revisions or variants of the Giddings And Lewis M – 1016 – 9443 itself. These could offer improvements such as better heat dissipation, higher – reliability components, or enhanced communication speeds, making them more suitable for specific industrial environments or applications with more demanding requirements.

Product Overview

Related Models

• GIDDINGS LEWIS [Model X] – An earlier version of the operator station, perhaps with a less advanced user interface or fewer monitoring capabilities compared to the GIDDINGS LEWIS 503 – 14622 – 10, but still used in some legacy CNC 800 setups.
• GIDDINGS LEWIS [Model Y] – A variant that may be optimized for specific types of machining operations, such as heavy – duty turning or high – precision milling, with additional controls or displays relevant to those processes.
• GIDDINGS LEWIS [Model Z] – Could be a more compact version of the operator station, suitable for applications where space is limited, but still providing the essential functionality for operating the CNC 800 system.
• GIDDINGS LEWIS [Model A] – This model might have enhanced connectivity options, allowing for easier integration with other industrial control systems or enterprise – level software, compared to the GIDDINGS LEWIS 503 – 14622 – 10.
• GIDDINGS LEWIS [Model B] – May feature an updated display technology, offering better visibility or more detailed graphics for operators, making it a potential upgrade option for those looking to improve the user experience of their CNC 800 operator station.
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Product Overview

Key Features and Benefits

Related Models

• Giddings & Lewis M.1900.9651: This could be an updated version of the M.1900.9650 drive shaft, perhaps with improved material properties or a modified spline design for enhanced performance in certain applications.
• Giddings & Lewis M.1899.9650: A potentially earlier iteration of the drive shaft, with a different set of specifications. It might have been designed for older – generation Giddings & Lewis machinery and could be a more cost – effective option for customers with legacy systems.
• Giddings & Lewis M.1900.9652: A variant of the drive shaft that could be optimized for use in a specific type of Giddings & Lewis machine, such as a particular model of horizontal boring mill, with design features tailored to the unique requirements of that machine.
• Giddings & Lewis M.1900.9649: Another related model, which may have a different length or diameter compared to the M.1900.9650, providing customers with more options for applications where space or load – bearing requirements vary.
• Giddings & Lewis M.1901.9650: This model could be an extended – functionality version of the M.1900.9650, perhaps with additional features like better corrosion resistance for use in harsh industrial environments.

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Product Overview

Technical Specifications

Key Features and Benefits

Related Models

• Giddings & Lewis PiC900 CSM/CPU 502 – 04125 – 01: This model combines the functions of a CSM and a CPU. It not only provides power to other modules like the Giddings & Lewis PiC900 CSM 502 – 03813 – 00 but also controls the PiC90 system and executes application programs, having features such as a 3 – terminal plug connector and a 1.2 ah 3V, 2/3a lithium battery.
• Giddings & Lewis PiC900 DC Output Module 502 – 03518 – 22R1: As an output module, it works in tandem with the Giddings & Lewis PiC900 CSM 502 – 03813 – 00. The CSM supplies power to this output module, which then sends out control signals to drive DC – powered devices in the industrial automation setup.
• Giddings & Lewis PiC900 Analog Input Module 502 – 03642 – 03R3: This analog input module is designed to interface with the Giddings & Lewis PiC900 CSM 502 – 03813 – 00. It receives analog signals (such as 0 – 10Vdc) from sensors in the industrial environment and transfers the data to the system through the communication infrastructure supported by the CSM.
• Giddings & Lewis PiC900 Asynchronous Serial Ethernet and Communication Module 502 – 03676 – 23R6: It expands the communication capabilities of the PiC900 system. The Giddings & Lewis PiC900 CSM 502 – 03813 – 00 powers this module, which in turn enables asynchronous serial ethernet communication, enhancing the system’s ability to connect with other network – enabled devices in the industrial setup.
• Giddings & Lewis PiC900 I/O Module 502 – 03842 – 02R3: This I/O module is another component that relies on the power from the Giddings & Lewis PiC900 CSM 502 – 03813 – 00. It provides additional input and output channels for the PiC900 system, allowing for more connections to sensors, actuators, and other field devices, further expanding the system’s control capabilities.

MKS 60 MHz GENERATOR EDGE 6060A – G02 660 – 210105R200 Product Introduction

Product Overview

Technical Specifications

Key Features and Benefits

Related Models

• MKS EDGE 6060A – G12: This is a related model within the MKS EDGE series. It may have some similarities in functionality, such as the 60 MHz frequency generation, but could also have differences in terms of power output capabilities, control features, or stability enhancements. For example, the G12 version might offer a higher maximum power output or more advanced control algorithms compared to the G02 model. In some applications where higher power levels are required for more intense plasma generation, the G12 model could be a more suitable choice.
• MKS EDGE 10060A: This model operates in a frequency range of 57 – 63 MHz and has a 10KW output power. While it has a different frequency range and higher power capacity compared to the 6060A – G02, they are both part of MKS’s RF generator product line. The EDGE 10060A could be used in applications where a broader frequency range or higher power levels are needed, such as in large – scale plasma processing for industrial coatings or advanced materials research. In contrast, the 6060A – G02 with its fixed 60 MHz frequency may be more tailored to specific processes that require this exact frequency for optimal results.
• MKS HMPS series: These are high – power microwave plasma systems. For example, the HMPX60S has a 6.0 kW microwave plasma source operating in the 2,440 – 2,470 MHz frequency range. Although they operate at much higher frequencies and power levels compared to the 6060A – G02, they are related in the sense that they are all used for plasma – related applications. The HMPS series might be used in applications that require high – power, high – frequency microwave plasma, such as in advanced surface cleaning and conditioning processes for high – tech materials. The 6060A – G02, on the other hand, is more focused on lower – frequency RF plasma generation for applications like semiconductor etching.

MKS ASTRONhf+ AX7635 – 10: A High – Performance Plasma Generator

Product Overview

Technical Specifications

• Power Output: While specific power details for the AX7635 – 10 aren’t elaborated in the given data, other models in the ASTRONhf+ series, like the RPS22L with part number AX7635 – 02, suggest a high – power – handling capability. The device is likely designed to provide sufficient power to drive the plasma – generation process efficiently in industrial – scale applications.
• Frequency Range: As part of the ASTRONhf+ family, it operates within a high – frequency range, typically in the HF (high – frequency) band. This frequency range is optimized for generating the type of plasma required for applications such as CVD chamber cleaning and thin – film deposition processes, where precise control over plasma reactions is essential.
• Dimensions and Physical Design: Although no dimensional data is available, it is designed to be compact enough for integration into existing industrial equipment setups. The design likely takes into account factors such as ease of installation, access for maintenance, and compatibility with other components in a production line.
• Operating Conditions: The MKS ASTRONhf+ AX7635 – 10 is engineered to operate in standard industrial environments. It can withstand typical temperature and humidity ranges found in manufacturing facilities. However, for optimal performance, it is recommended to operate within the specified environmental limits provided in the product documentation.

Key Features and Benefits

• Reliable Plasma Generation: MKS has a reputation for manufacturing high – quality equipment, and the ASTRONhf+ AX7635 – 10 is no exception. It is designed to provide reliable and consistent plasma generation over extended periods. This reliability is crucial in industrial processes where even minor fluctuations in plasma quality can lead to product defects or inefficiencies. In semiconductor manufacturing, for example, consistent plasma generation is essential for achieving precise etching and deposition processes, ensuring the production of high – quality chips.
• Efficient Chamber Cleaning: One of the primary applications of the AX7635 – 10 is cleaning CVD process chambers. Its ability to generate atomic fluorine and effectively remove waste deposits makes it an efficient solution. The reduced wear and tear on the chamber due to this cleaning method not only extends the lifespan of the chamber but also reduces the frequency of chamber replacements, leading to increased productivity and cost savings for manufacturers.
• Compatibility with Industrial Processes: The ASTRONhf+ AX7635 – 10 is designed to be easily integrated into existing industrial production lines. It can work in tandem with other MKS components as well as equipment from other manufacturers. This compatibility allows for seamless integration into complex manufacturing setups, whether it’s a large – scale semiconductor fabrication facility or a smaller – scale thin – film deposition operation.
• Environmental Considerations: By generating new gases that can be readily scrubbed during the chamber – cleaning process, the AX7635 – 10 helps minimize the environmental impact of industrial operations. This is in line with the growing global focus on sustainable manufacturing practices, making it an attractive option for companies looking to reduce their environmental footprint.
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Related Models

• MKS ASTRONhf – s 15L RPS (AX7645PS – 01): This model, with its own unique specifications, is part of the MKS ASTRONhf product line. It may have different power ratings, frequency characteristics, or application – specific optimizations compared to the AX7635 – 10. While the AX7635 – 10 might be more focused on general – purpose plasma generation for a range of industrial processes, the ASTRONhf – s 15L RPS could be tailored for specific applications, such as certain types of reactive gas generation in a more specialized manufacturing process.
• MKS ASTRONhf+ RPS22L (AX7635 – 02): Similar to the AX7635 – 10, the RPS22L with part number AX7635 – 02 is also from the ASTRONhf+ series. It may have variations in power output or other performance parameters. The RPS22L could be designed for applications that require a slightly different power – handling capacity or have specific requirements for the plasma – generation process, such as in a different type of CVD chamber cleaning or a more demanding thin – film deposition application.
• MKS AX7610S Downstream Microwave Plasma Source: This is a different type of plasma source from MKS. Operating in the microwave frequency range compared to the HF operation of the ASTRONhf+ series, the AX7610S is designed for remote plasma applications with a replaceable sapphire plasma tube. It is ideally suited for more severe chemistries like CF4, CHF3, and NF3. In contrast to the AX7635 – 10, which may be more versatile in general industrial plasma applications, the AX7610S is specialized for applications where the unique properties of microwave – generated plasma and the use of these specific chemistries are required, such as in certain high – precision semiconductor manufacturing processes.

• BENTLY	3500/40-01-CN
  BENTLY	3500/40-03-00
  BENTLY	3500/42-04-00
  BENTLY	3500/42-04-01
  BENTLY	3500/42M-01-CN

Product Overview

Technical Specifications

Key Features and Benefits

High-Power Plasma Generation

Modular Design for Flexibility

Real-Time Diagnostics

Compatibility with MKS Ecosystem

Cost-Effective “As-Is” Solution

Related Models

• MKS EDGE6060A-G12 – Upgraded variant with enhanced cooling and extended temperature range for extreme industrial environments .
• MKS EDGE210R40A-G02 – 400 kHz RF generator for low-frequency plasma applications, such as sputtering and plasma-enhanced chemical vapor deposition (PECVD) .
• MKS EDGE10060A – 57–63 MHz generator with 10 kW output, suitable for high-throughput semiconductor manufacturing .
• MKS SmartMatch® Tuner – Companion module for automated impedance matching, optimizing power transfer in dynamic plasma processes.
• MKS 902B-11030 Pressure Transducer – Complementary sensor for real-time plasma chamber pressure monitoring.

Product Overview

Technical Specifications

Key Features and Benefits

1. Precision Power Control: The EDGE6060A-G02 employs advanced digital signal processing (DSP) to maintain ±1% power stability, ensuring consistent plasma density for uniform film deposition or etching profiles. Its multi-level pulsing capability supports complex process recipes, while real-time diagnostics monitor power output and impedance to prevent process drift.
2. Robust Arc Management: Built-in arc detection and suppression technology minimizes downtime by quickly isolating and recovering from plasma arcs, protecting both the generator and downstream components like electrodes or chambers. This feature is critical for high-throughput semiconductor manufacturing environments.
3. Modular System Integration: Designed for compatibility with MKS NavX™ matching networks, the EDGE6060A-G02 enables rapid impedance matching to optimize power transfer efficiency. Its open communication protocols facilitate integration with third-party SCADA systems or MKS’ System 800xA platform for centralized process monitoring.
4. Compact and Efficient Design: The water-cooled architecture reduces heat dissipation, allowing operation in confined spaces without compromising performance. The 19” rack-mount form factor simplifies installation in standard industrial control cabinets, while the generator’s high-efficiency power supply minimizes energy costs.
5. As-Is Condition with Assurance: While sold in an “As-Is” state, the EDGE6060A-G02 undergoes thorough functional testing by Hainan Jinlin Electromechanical to verify key parameters (e.g., frequency stability, power output). Our team provides detailed inspection reports and offers optional refurbishment services to extend operational life.
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Related Models

• MKS EDGE6060A-G12 – Upgraded variant with extended frequency range (57–63MHz) and higher power output (up to 10kW), suitable for advanced plasma processes requiring broader tuning flexibility.
• MKS RD5060Z – 60MHz generator with 2000W output, designed for lower-power applications like R&D or small-scale production lines.
• MKS NAVX™ MATCHING NETWORK – Complementary impedance-matching module to maximize power transfer efficiency when paired with the EDGE6060A-G02.
• MKS ALTA 6kW – Next-generation RF generator with advanced digital control and frequency agility, ideal for retrofitting older EDGE series systems.
• MKS ELITE 750 – 13.56MHz generator for lower-frequency plasma applications, often used alongside 60MHz systems in dual-frequency setups.

Hainan Jinlin Electromechanical’s Value Proposition

• Expert Technical Support: Pre-sales consultation to align the EDGE6060A-G02 with your process requirements, including compatibility assessments and system design recommendations.
• Reliable After-Sales Service: While “As-Is” products are sold without warranty, we provide a 30-day functional guarantee and optional extended service plans for peace of mind.
• Fast Delivery: Global logistics network ensures prompt delivery of the EDGE6060A-G02 and related spares, minimizing downtime during system upgrades.